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Specifically designed for the precision thinning of semiconductor wafers (such as silicon and silicon carbide). The product boasts a comprehensive range of specifications, enabling efficient material removal while minimizing subsurface damage to the greatest extent possible, thereby achieving outstanding processing accuracy and extended tool life.

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Specifically designed for precise shaping and polishing of wafer edges, this tool effectively removes sharp edges and microcracks at the wafer’s periphery, enhancing mechanical strength and preventing stress concentrations and chipping during subsequent processing steps. It is a critical tool for ensuring high yield rates.

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The dressing tools—such as thinning wheels and edge-beveling wheels—that are used in conjunction with grinding wheels can efficiently dress surfaces, restoring their performance and flatness. These tools are crucial for maintaining a stable grinding rate and ensuring high product yield and consistency.

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Specifically designed for processing semiconductor wafers, packaging substrates, and various hard and brittle materials. With its exceptional cutting accuracy, it delivers outstanding cross-sectional quality while maintaining high stability and longevity.

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A high-performance nanoscale polishing slurry specifically designed for the semiconductor wafer CMP process. Through the synergistic action of unique chemical etching and mechanical abrasion, it achieves precise material removal at the nanoscale, enabling global planarization of wafers.

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About Us

Focus on efficient grinding, empowering China's manufacturing.

Hangzhou Xinyankex Semiconductor Materials Co., Ltd. specializes in the R&D, production, and sales of precision grinding, lapping, and polishing products for the semiconductor industry. The company boasts an outstanding R&D team in the industry and has successfully substituted imported products with its own offerings. Equipped with professional production, R&D, and inspection equipment, the company has a production capacity of 30,000 precision semiconductor processing tools and is committed to providing comprehensive solutions for grinding, lapping, and polishing products to customers in the semiconductor industry.

2018

Team establishment date

200 +

Cooperative clients

30000 +

Production capacity

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芯研科

Three Major Advantages


We have always upheld the spirit of craftsmanship, consistently adhering to the principle of “quality first, customer foremost,” and continuously innovating and developing. With sophisticated manufacturing processes and a robust product quality control system, we help our customers create greater value.

High speed

High stability and consistency

High precision

Full-process data traceability

High security

Full-process MES system monitoring